Sale!

Cleansing Radiance Face Mask – Skin Care Products

Original price was: $51.55.Current price is: $15.46.

Select:

SKU: SK0035468-US20260630-111630 Category:

Description

Age:18+
Brand:Youth Lab.
Line:Face Care
Product Type:Face Mask
Product Properties:Cleansing, Pore Tightening
Volume:50 ml
Ingredients:AHA Acids, Alcohol, Allantoin, Almond, Citronella, Citrus, Clay, Gaultheria, Geranium, Glycerin, Glycolic Acid, Lemon, Lime, Titanium Dioxide, Zinc PCA
Feature:Vegan
Scent:Scent-Free
When To Use:Universal
Gender:For women
Classification:Dermatocosmetics
Skin Type:All Types, Allergic, Sensitive
Country:Greece
Made in:Greece
Caution:For external use only, If an allergic reaction or irritation occurs, discontinue use

The “Purifying Radiance” face mask deeply cleanses the skin, providing gentle exfoliation and activating cell renewal. It removes excess oil and dirt, regulates oil production, and visibly tightens enlarged pores. It also reduces redness and potential breakouts. See your skin refreshed and glowing in just 10-15 minutes! Suitable for all skin types, even sensitive skin (requires a shorter application time).

Apply to damp skin using gentle circular motions, avoiding the eye area. For best results, leave on for 5 minutes. Rinse off with warm water. Use 1 to 2 times a week, or as needed.

Aqua, Kaolin, Glycerin, C12-20 Acid PEG-8 Ester, Magnesium Aluminum Silicate, Glycolic Acid, Titanium Dioxide, Isodecyl Salicylate, C12-13 Alkyl Lactate, Parfum, Butylene Glycol, Gaultheria Procumbens Leaf Extract, Menthyl Lactate, Benzyl Alcohol, Xanthan Gum, Zinc PCA, Sodium Dehydroacetate, Alcohol, Allantoin, Epilobium Angustifolium Leaf Extract, Sodium Hydroxide, Fomes Officinalis Extract, Dehydroacetic Acid, Sodium Phytate, Prunus Amygdalus Dulcis Oil, Hydrogenated Vegetable Oil, Citrus Aurantifolia Peel Oil Distilled, Geraniol, Linalool, Citronellol, Limonene, Alpha-Isomethyl Ionone.

Reviews

There are no reviews yet.

Be the first to review “Cleansing Radiance Face Mask – Skin Care Products”

Your email address will not be published. Required fields are marked *